Tungsten Targets for PVD Sputtering and Thin Film Deposition

Tungsten Targets

Tungsten targets are highly engineered blocks, discs, or cylinders of ultra-high-purity tungsten or tungsten alloys.

Unlike structural tungsten products, targets are sacrificial source materials used in advanced thin-film deposition technologies.

Main applications include Physical Vapor Deposition (PVD), sputtering systems, and X-ray generation.

They are critical materials in semiconductor, AI hardware, and medical imaging industries.

Application and Classification

Grades and Usage of Tungsten Targets

Pure Tungsten W1 (≥99.95%): Most common for thin film deposition.

Tungsten Alloys:

W-Ti (e.g., W-10%Ti): Diffusion barriers in semiconductor devices.

WSi₂ (Tungsten Silicide): Gate electrodes and interconnect layers.

WC (Tungsten-Carbon): Hard, wear-resistant coating applications.

W-Re (Tungsten-Rhenium): Improved ductility and thermal stability.

Doped Tungsten: Lanthanated (W-La) or rare-earth doped for electronic performance tuning.